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2022-08-07
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The mask overlapping method of the silk printing device, the silk printing device

[patent type] invention patent

[patent name] the mask overlapping method of the silk printing device, the silk printing device

[applicant] Yamaha Engine Co., Ltd.

[inventor] three generations can be your house auspicious history

[address of the main applicant] Shizuoka Prefecture, Japan

[application No.] 5

[application date] 2004.04.23

[approval Announcement No.] Nevertheless,

[approval announcement date] 2006.06.07

[main classification No.] b41f15/26 (2006.01) i

[classification No.] b41f15/26 (2006.01) i

[priority item] 2003.5.9 JP 131678/2003

[sovereignty item] 1 A mask overlapping method of a silk printing device, which overlaps a mask having an opening for printing, a holding unit for holding a substrate as a printed object, and a driving unit for moving the mask relative to the holding unit, and the mask and the substrate of the silk printing device for printing by overlapping the substrate held on the holding unit and the mask through the driving unit, The utility model is characterized in that: before overlapping the mask and the substrate, the circuit diagram of the substrate and the printing opening part of the mask corresponding to the circuit diagram are photographed, the position error of the image of the circuit diagram and the printing opening part is calculated according to the image data, and the driving unit is controlled according to the error to overlap the mask and the substrate

[in other words, adopting the contact gauge measurement method will have a great impact on the tensile test of the sample] d

[international application] pct/jp2004/005852

[international publication] wo2004/098887

[Abstract] the silk printing device of the present invention includes a mask (7) with an opening for printing and a substrate support device (3) that can move relative to the mask (7) to maintain the substrate W as the printed object, Through the operation of the substrate support device (3), the substrate W and the mask (7) are overlapped for printing. The mask overlapping method of the silk printing device of the invention is to photograph the circuit diagram of the substrate W and the printing opening part of the mask (7) corresponding to the circuit diagram before overlapping the mask (7) and the substrate W, calculate the deviation (position error) between the circuit diagram and the printing opening part and the petroleum based high molecular material according to these image data, and drive and control the substrate support device (3) according to the error, so that the mask and the substrate overlap

[agent] Zhongyuan Xinda Intellectual Property Agency Co., Ltd.

[agent] luyitian Junfeng

source: Beijing Wanfang Data Co., Ltd

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